Robust sub-100 nm T-Gate fabrication process using multi-step development

Karami, K. , Dhongde, A., Cheng, H., Reynolds, P. M. , Reddy, B. A., Ritter, D., Li, C. , Wasige, E. and Thoms, S. (2023) Robust sub-100 nm T-Gate fabrication process using multi-step development. Micro and Nano Engineering, 19, 100211. (doi: 10.1016/j.mne.2023.100211)

Abstract

We demonstrate the fabrication of sub-100 nm T-Gate structures using a single electron beam lithography exposure and a tri-layer resist stack - PMMA/LOR/CSAR. Recent developments in modelling resist development were used to design the process, in which each resist is developed separately to optimise the resulting structure. By using a modelling approach and proximity correcting for the full resist stack, we were able to independently vary gate length (50-100 nm) and head size (250-500 nm) at the design stage and fabricate these T-Gates with high yield.

• Item Type: Articles
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Thoms, Dr Stephen and Wasige, Professor Edward and Dhongde, Aniket and CHENG, Huihua and Karami, Mr Kaivan and Li, Professor Chong and Reynolds, Dr Paul
• Authors: Karami, K., Dhongde, A., Cheng, H., Reynolds, P. M., Reddy, B. A., Ritter, D., Li, C., Wasige, E., and Thoms, S.
• College/School: College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering; College of Science and Engineering > School of Engineering > James Watt Nanofabrication Centre
• Journal Name: Micro and Nano Engineering
• Publisher: Elsevier
• ISSN: 2590-0072
• ISSN (Online): 2590-0072
• Published Online: 29 May 2023
• Copyright Holders: Copyright © 2023 The Authors
• First Published: First published in Micro and Nano Engineering 19: 100211
• Publisher Policy: Reproduced under a Creative Commons License

Project Code	Award No	Project Name	Principal Investigator	Funder's Name	Funder Ref	Lead Dept
301178		Novel GaN Power Devices and Packaging Technologies for 300 degC Ambient Operation	Edward Wasige	Engineering and Physical Sciences Research Council (EPSRC)	EP/R024413/1	ENG - Electronics & Nanoscale Engineering