Sub-micron, Metal Gate, High-к Dielectric, Implant-free, Enhancement-mode III-V MOSFETs

Moran, D.A.J. et al. (2007) Sub-micron, Metal Gate, High-к Dielectric, Implant-free, Enhancement-mode III-V MOSFETs. In: 37th European Solid State Device Research Conference (ESSDERC 2007), Munich, Germany, 11-13 September 2007, pp. 466-469. ISBN 9781424411245 (doi:10.1109/ESSDERC.2007.4430979)

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Publisher's URL: http://dx.doi.org/10.1109/ESSDERC.2007.4430979

Abstract

The performance of 300nm, 500nm and 1μm metal gate, implant free, enhancement mode III-V MOSFETs are reported. Devices are realised using a 10nm MBE grown Ga2O3/(GaxGd1-x)2O3 high-κ (κ=20) dielectric stack grown upon a δ-doped AlGaAs/InGaAs/AlGaAs/GaAs heterostructure. Enhancement mode operation is maintained across the three reported gate lengths with a reduction in threshold voltage from 0.26 V to 0.08 V as the gate dimension is reduced from 1 μm to 300 nm. An increase in transconductance is also observed with reduced gate dimension. Maximum drain current of 420 μA/μm and extrinsic transconductance of 400 µS/µm are obtained from these devices. Gate leakage current of less than 100pA and subthreshold slope of 90 mV/decade were obtained for all gate lengths. These are believed to be the highest performance submicron enhancement mode III-V MOSFETs reported to date.

Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Thoms, Dr Stephen and Li, Dr Xu and Zhou, Dr Haiping and Thayne, Professor Iain and Moran, Dr David
Authors: Moran, D.A.J., Hill, R.J.W., Li, X., Zhou, H., McIntyre, D., Thoms, S., Droopad, R., Zurcher, P., Rajagopalan, K., Abrokwah, J., Passlack, M., and Thayne, I.G.
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
University Centres > Glasgow Materials Research Initiative
Publisher:IEEE
ISSN:1930-8876
ISBN:9781424411245
Copyright Holders:Copyright © 2007 IEEE
First Published:First published in 37th European Solid State Device Research Conference (ESSDERC 2007)
Publisher Policy:Reproduced in accordance with the copyright policy of the publisher.

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
358573Sub 100nm 111-V MOSFET's for Digital ApplicationsIain ThayneEngineering & Physical Sciences Research Council (EPSRC)GR/S61218/01Electronic and Nanoscale Engineering