Fabrication of multilevel silicon diffractive lens at terahertz frequency

Saha, S.C., Li, C. , Ma, Y., Grant, J.P. and Cumming, D.R.S. (2013) Fabrication of multilevel silicon diffractive lens at terahertz frequency. IEEE Transactions on Terahertz Science and Technology, 3(4), pp. 479-485. (doi: 10.1109/TTHZ.2013.2251929)

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In this paper, we fabricated an anisotropically etched multilevel silicon diffractive lens. The operating frequency and focal length of the lens are 2.52 THz and 15 mm, respectively. Both 4- and 16-level lenses have been realized. The total etch depth and size of the lenses are 49 $mu{hbox{m}}$ and 45 mm $times$45 mm. Positive tone thick resist AZ 4562 was used as a mask material for dry etching the high resistivity silicon substrate. We have characterized the lens using a high power continuous wave far infrared laser operating at 2.52 THz. The measured results show good agreement with the designed specifications.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Li, Dr Chong and Saha, Dr Shimul and Ma, Mr Yong and Cumming, Professor David and Grant, Dr James
Authors: Saha, S.C., Li, C., Ma, Y., Grant, J.P., and Cumming, D.R.S.
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Research Group:Microsystem Technology
Journal Name:IEEE Transactions on Terahertz Science and Technology
ISSN (Online):2156-3446

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