Li, X. , Zhou, H., Hill, R., Holland, M. and Thayne, I.G. (2008) Low damage inductively coupled plasma etching of sub-100 nm platinum gate line in SF6/C4F8 for III-V MOSFET fabrication process. In: 34th International Conference on Micro- and Nano-Engineering (MNE 2008), Athens, Greece, 15-18 September 2008,
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| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Zhou, Dr Haiping and Thayne, Prof Iain and Hill, Mr Richard and Li, Dr Xu and Holland, Dr Martin |
| Authors: | Li, X., Zhou, H., Hill, R., Holland, M., and Thayne, I.G. |
| College/School: | College of Science and Engineering > School of Engineering College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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