An optical leveling technique for parallel near-field photolithography system

Liu, Z., Chen, X., Zhang, Y., Weaver, J. and Roberts, C.J. (2012) An optical leveling technique for parallel near-field photolithography system. Applied Physics Letters, 101(17), p. 173112. (doi: 10.1063/1.4764912)

Full text not currently available from Enlighten.


Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Weaver, Professor Jonathan and Zhang, Dr Yuan
Authors: Liu, Z., Chen, X., Zhang, Y., Weaver, J., and Roberts, C.J.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Applied Physics Letters
ISSN:0003-6951
Published Online:25 October 2012

University Staff: Request a correction | Enlighten Editors: Update this record