Simple e-beam air-bridge technology for mm-wave applications

Khalid, A. , Li, C. , Grant, J. , Saha, S., Ferguson, S. and Cumming, D. (2012) Simple e-beam air-bridge technology for mm-wave applications. Microelectronic Engineering, 98, pp. 262-265. (doi: 10.1016/j.mee.2012.06.006)

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We describe a new air-bridge fabrication technology using electron beam lithography. This novel technique greatly simplifies the lithographic process, eliminating the requirement for complex writing control procedures used in established electron-beam lithography based processes. The new technique is demonstrated using single-dose per layer electron beam lithography and is applied to the fabrication of microwave and millimeter-wave waveguide structures.

Item Type:Articles
Additional Information:Special issue MNE 2011 - Part II
Glasgow Author(s) Enlighten ID:Saha, Dr Shimul and Li, Dr Chong and Cumming, Professor David and Grant, Dr James and Khalid, Dr Ata-Ul-Habib and Ferguson, Mrs Susan
Authors: Khalid, A., Li, C., Grant, J., Saha, S., Ferguson, S., and Cumming, D.
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Research Group:MicroSystem Technology
Journal Name:Microelectronic Engineering
ISSN (Online):1873-5568
Published Online:27 June 2012

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
497131Novel Thermal Management Concepts: High Power High Frequency Planar Gunn DiodeDavid CummingEngineering & Physical Sciences Research Council (EPSRC)EP/H011862/1ENG - ENGINEERING ELECTRONICS & NANO ENG