Zhang, Y., Dobson, P. and Weaver, J. (2011) Batch fabricated dual cantilever resistive probe for scanning thermal microscopy. Microelectronic Engineering, 88(8), pp. 2435-2438. (doi: 10.1016/j.mee.2011.02.040)
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Publisher's URL: http://dx.doi.org/10.1016/j.mee.2011.02.040
Abstract
In this study dual cantilever resistive probes for scanning thermal microscopy (SThM) have been batch fabricated. In the dual probe, one is used as local heater and a second one nearby detects the thermal diffusivity at a microscopic scale. Various types of dual probes have been fabricated in one batch to allow experimental determination of the optimal sensor type for the measurement. Thermal scans with the dual cantilever probes have been performed in atmosphere, and contrast in thermal imaging indicating the difference of thermal conductivity is shown. Test of these probes under vacuum indicates strong thermal coupling through air between the two probes in the dual cantilever probes.
Item Type: | Articles |
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Additional Information: | Proceedings of the 36th International Conference on Micro- and Nano-Engineering (MNE) |
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Weaver, Professor Jonathan and Dobson, Dr Phil and Zhang, Dr Yuan |
Authors: | Zhang, Y., Dobson, P., and Weaver, J. |
Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Research Group: | AFM |
Journal Name: | Microelectronic Engineering |
Publisher: | Elsevier |
ISSN: | 0167-9317 |
Published Online: | 15 February 2011 |
Copyright Holders: | Copyright © 2011 Elsevier |
First Published: | First published in Microelectronic Engineering 88(8):2435-2438 |
Publisher Policy: | Reproduced in accordance with the copyright policy of the publisher |
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