A model for digital preservation repository risk relationships

McHugh, A. (2012) A model for digital preservation repository risk relationships. In: World Library and Information Congress: 78th IFLA General Conference and Assembly, Helsinki, Finland, 11-17 Aug 2012,

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The paper introduces the Preserved Object and Repository Risk Ontology (PORRO), a model that relates preservation functionality with associated risks and opportunities for their mitigation. Building on work undertaken in a range of EU and UK funded research projects (including the Digital Curation Centre , DigitalPreservationEurope and DELOS ), this ontology illustrates relationships between fundamental digital library goals and their parameters; associated rights and responsibilities; practical activities and resources involved in their accomplishment; and risks facing digital libraries and their collections. Its purpose is to facilitate a comprehensive understanding of risk causality and to illustrate opportunities for mitigation and avoidance. The ontology reflects evidence accumulated from a series of institutional audits and evaluations, including a specific subset of digital libraries in the DELOS project which led to the definition of a digital library preservation risk profile. Its applicability is intended to be widespread, and its coverage expected to evolve to reflect developments within the community. Attendees will gain an understanding of the model and learn how they can utilize this online resource to inform their own risk management activities.

Item Type:Conference Proceedings
Glasgow Author(s) Enlighten ID:McHugh, Dr Andrew
Authors: McHugh, A.
Subjects:T Technology > T Technology (General)
Z Bibliography. Library Science. Information Resources > Z665 Library Science. Information Science
College/School:College of Arts & Humanities > School of Humanities > Information Studies
Copyright Holders:Copyright © 2012 The Author
First Published:First published in Proceedings of World Library and Information Congress: 78th IFLA General Conference and Assembly
Publisher Policy:Reproduced with permission of the author
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