Atomic imaging of atomic layer deposition oxide nucleation with trimethylaluminum on As-rich InGaAs(001) 2 × 4 vs Ga∕In-rich InGaAs(001) 4 × 2

Melitz, W., Kent, T., Kummel, A.C., Droopad, R., Holland, M. and Thayne, I. (2012) Atomic imaging of atomic layer deposition oxide nucleation with trimethylaluminum on As-rich InGaAs(001) 2 × 4 vs Ga∕In-rich InGaAs(001) 4 × 2. Journal of Chemical Physics, 136(15), p. 154706. (doi: 10.1063/1.4704126)

Abstract

Formation of a contaminant free, flat, electrically passive interface to a gate oxide such as a-Al2O3 is the critical step in fabricating III-V metal oxide semiconductor field effect transistors; while the bulk oxide is amorphous, the interface may need to be ordered to prevent electrical defect formation. A two temperature in situ cleaning process is shown to produce a clean, flat group III or group V rich InGaAs surface. The dependence of initial surface reconstruction and dosing temperature of the seeding of aluminum with trimethylaluminum dosing is observed to produce an ordered unpinned passivation layer on InGaAs(001)-(4 × 2) surface at sample temperatures below 190 °C. Conversely, the InGaAs(001)-(2 × 4) surface is shown to generate an unpinned passivation layer with a seeding temperature up to 280 °C. For both reconstructions, the chemical drive force is consistent with formation of As-Al-As bonds. The optimal seed layer protects the surface from background contamination.

• Item Type: Articles
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Thayne, Prof Iain
• Authors: Melitz, W., Kent, T., Kummel, A.C., Droopad, R., Holland, M., and Thayne, I.
• College/School: College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
• Journal Name: Journal of Chemical Physics
• ISSN: 0021-9606
• Published Online: 19 April 2012