Transmission electron microscopy characterisation of permalloy elements fabricated by focussed ion beam lithography

O' Neill, R.W. and McVitie, S. (2006) Transmission electron microscopy characterisation of permalloy elements fabricated by focussed ion beam lithography. Journal of Physics: Conference Series, 26, pp. 187-190. (doi: 10.1088/1742-6596/26/1/044)

Abstract

20 nm thick permalloy elements, with dimensions of 500 x 500 nm(2) and 1000 x 200 nm(2), have been fabricated on 50 nm thick silicon nitride substrate by milling using a focussed ion beam (FIB) microscope. The dose of ion beam used for the milling was varied in order to achieve the best definition for the milled areas. The FIB milled elements were characterised physically by atomic force microscopy (AFM) and bright field transmission electron microscopy (TEM) and magnetically by Fresnel imaging on a TEM modified for magnetic imaging. The FIB milled elements were found to have a more irregular edge and lower magnetic fields for events such as vortex annihilation when compared to elements of the same dimensions fabricated by conventional electron beam microscopy (EBL).

• Item Type: Articles
• Additional Information: EMAG-NANO 2005: Imaging, Analysis and Fabrication on the Nanoscale
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: McVitie, Professor Stephen
• Authors: O' Neill, R.W., and McVitie, S.
• College/School: College of Science and Engineering > School of Physics and Astronomy
• Journal Name: Journal of Physics: Conference Series
• Publisher: Institute of Physics
• ISSN: 1742-6588
• ISSN (Online): 1742-6596