Pedersen, R.H., Scurr, D.J., Roach, P., Alexander, M.R. and Gadegaard, N. (2012) Full-thickness characterization of plasma polymerized hexane films irradiated by an electron beam. Plasma Processes and Polymers, 9(1), pp. 22-27. (doi: 10.1002/ppap.201100067)
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Publisher's URL: http://dx.doi.org/10.1002/ppap.201100067
Abstract
Thin plasma polymerized hexane (ppHex) films have been shown to be useful as a novel resist for electron beam lithography. We present time-of-flight secondary ion mass spectroscopy analysis of similar to 50?nm thick ppHex films deposited at two different RF powers (10 and 50?W) followed by exposure to an electron beam at various doses. As-deposited, high-power and low-power films exhibit differences in chemical composition, explaining an experimentally observed difference in solubility. Exposure of the ppHex films to an electron beam at high doses (>5?mC?cm-2) increases the amount of cross-linking in the ppHex film, rendering them insoluble in a developer, and allowing for the material to be used as a novel resist for electron beam lithography.
| Item Type: | Articles |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Pedersen, Mr Rasmus and Gadegaard, Professor Nikolaj |
| Authors: | Pedersen, R.H., Scurr, D.J., Roach, P., Alexander, M.R., and Gadegaard, N. |
| College/School: | College of Science and Engineering > School of Engineering > Biomedical Engineering |
| Journal Name: | Plasma Processes and Polymers |
| Publisher: | Wiley |
| ISSN: | 1612-8850 |
| ISSN (Online): | 1612-8869 |
| Published Online: | 10 October 2011 |
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