A simple method for high yield fabrication of sharp silicon tips

Burt, D. P., Dobson, P. S. , Donaldson, L. and Weaver, J. M. R. (2008) A simple method for high yield fabrication of sharp silicon tips. Microelectronic Engineering, 85(3), pp. 625-630. (doi: 10.1016/j.mee.2007.11.010)

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A simple, high yield, method for the fabrication of sharp silicon tips is described. A triangular etch mask design is used to ensure that the tip forms with a single point. An anisotropic wet etch gives rise to a tip that continues to "self-sharpen" after the etch mask is released. The tip geometry comprises three converging {1 1 3} planes towards the apex with {3 1 3} planes forming at the base. The apex of each tip typically has a radius of curvature of <5 nm, which can be reduced to <2 nm by a subsequent oxide sharpening process. Tips of this kind have been successfully integrated into the fabrication of atomic force microscopy probes.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Burt, Dr David and Weaver, Professor Jonathan and Dobson, Dr Phil and Donaldson, Mrs Lesley
Authors: Burt, D. P., Dobson, P. S., Donaldson, L., and Weaver, J. M. R.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronic Engineering
ISSN (Online):1873-5568
Published Online:03 December 2007

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
390741Batch Fabrication of single-walled carbon nanotube atomic force microscopy probes and nanowiresJonathan WeaverEngineering & Physical Sciences Research Council (EPSRC)EP/C518276/1Electronic and Nanoscale Engineering