Very high resolution etching of magnetic nanostructures in organic gases

Kong, X., Krasa, D., Zhou, H. P., Williams, W., McVitie, S. , Weaver, J. M. R. and Wilkinson, C. D. W. (2008) Very high resolution etching of magnetic nanostructures in organic gases. Microelectronic Engineering, 85(5-6), pp. 988-991. (doi: 10.1016/j.mee.2007.12.006)

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Two methods for high resolution dry etching of permalloy (NiFe) and iron (Fe) nanostructures are presented and discussed. The first involves the use of carbon monoxide (CO) and ammonia (NH3) as etching gases, the second uses methane (CH4), hydrogen (H-2) and oxygen (O-2). In both etching processes volatile metallo-organic compounds are the resulting reaction products. The patterned and dry etched thin films were observed with SEM and TEM to study the quality of each of the two processes. It is found that the CO/NH3 process yields higher etch rates, higher selectively with respect to the SiN mask used, and less redeposition than the CH4/H-2/O-2 process. (C) 2007 Elsevier B.V. All rights reserved

Item Type:Articles
Additional Information:33rd International Conference on Micro- and Nano-Engineering Copenhagen, DENMARK, SEP 23-26, 2007
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and McVitie, Professor Stephen and Weaver, Professor Jonathan and Kong, Dr Xiang and Wilkinson, Professor Christopher
Authors: Kong, X., Krasa, D., Zhou, H. P., Williams, W., McVitie, S., Weaver, J. M. R., and Wilkinson, C. D. W.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronic Engineering
ISSN (Online):1873-5568
Published Online:16 December 2007

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
397871Establishing performance limits in ultra-small magnetic elementsJohn ChapmanEngineering & Physical Sciences Research Council (EPSRC)EP/C008154/1S&E COLLEGE SENIOR MANAGEMENT
405421The role of magnetostatic interactions on palaeo and environmental magnetic signals - quantification using nanoimprint lithographyChristopher WilkinsonNatural Environment Research Council (NERC)NE/C510159/1SCHOOL OF ENGINEERING