Burt, D.P., Whyte, W.M., Weaver, J.M.R., Glidle, A., Edgeworth, J.P., Macpherson, J.V. and Dobson, P.S. (2009) Effects of metal underlayer grain size on carbon nanotube growth. Journal of Physical Chemistry C, 113(34), pp. 15133-15139. (doi: 10.1021/jp902117g)
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Abstract
In this paper we demonstrate that the nucleation density of single-walled carbon nanotubes (SWNTs), formed by thermal catalytic chemical vapor deposition, strongly depends on the grain size of Al underlayers covered with a native oxide (Al/Al2O3). By varying the Substrate temperature during Al sputter deposition it was possible to investigate the effect of Al grain size on growth without inducing changes in the underlayer thickness, surface chemistry, or any other growth parameter. The resulting SWNT growth structures ranged from low-density 2D nanotube networks that lay across the surface of the substrate to high density 3D nucleation which gave rise to vertical "forest" growth. The height of the SWNT "forest" was observed to increase with increasing Al deposition temperature as follows, 200 > 100 > 60 > 20 degrees C on Si/Al but in the order 100 > 200 > 60 > 20 degrees C on SiO2/Al substrates for fixed growth conditions. The differences in the SWNT growth trends on Si and SiO2 substrates are believed to be due to the existence of an optimal Al/Al2O3 underlayer grain size for the formation of active catalytic nanoparticles, with larger Al/Al2O3 grains forming on SiO2 than Si at a fixed substrate temperature. Numerous surface analysis techniques including AFM, XPS, FESEM, TEM, and Raman spectroscopy have been employed to ascertain that the observed changes in nanotube growth for this system are related primarily to changes in underlayer morphology
| Item Type: | Articles |
|---|---|
| Keywords: | Buffer layer, catalyst deactivation, chemical-vapor-deposition, density, deposition, diffusion, emission properties, England, force microscopy, growth, millimeter-long, nanoparticles, nickel, oxide, probe microscopy, science, SI, spectroscopy, substrate, system, thickness |
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Burt, Dr David and Weaver, Professor Jonathan and Glidle, Dr Andrew and Dobson, Dr Phil |
| Authors: | Burt, D.P., Whyte, W.M., Weaver, J.M.R., Glidle, A., Edgeworth, J.P., Macpherson, J.V., and Dobson, P.S. |
| College/School: | College of Science and Engineering > School of Engineering College of Science and Engineering > School of Engineering > Biomedical Engineering College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Journal Name: | Journal of Physical Chemistry C |
| Journal Abbr.: | J. phys. chem. C |
| ISSN: | 1932-7447 |
| ISSN (Online): | 1932-7455 |
| Published Online: | 05 August 2009 |
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