Li, X., Cao, X., Zhou, H., Wilkinson, C., Thoms, S., Macintyre, D., Holland, M. and Thayne, I. (2005) A low damage RIE process for the fabrication of cmpound semiconductor based transistors wtih sub-100nm tungsten gates. In: 31st International Conference on Micro and Nano-Engineering 2005, Vienna, Austria,
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Item Type: | Conference Proceedings |
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Keywords: | Damage, Fabrication, Gate, Rie, Semiconductor, Transistors |
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Zhou, Dr Haiping and Thayne, Prof Iain and Macintyre, Dr Douglas and Thoms, Dr Stephen and Li, Dr Xiang and Wilkinson, Professor Christopher and Holland, Dr Martin |
Authors: | Li, X., Cao, X., Zhou, H., Wilkinson, C., Thoms, S., Macintyre, D., Holland, M., and Thayne, I. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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