The impact of high-k dielectrics on the future performance of nano-scale MOSFETs

Watling, J., Yang, L., Barker, J. and Asenov, A. (2004) The impact of high-k dielectrics on the future performance of nano-scale MOSFETs. In: IoP Condensed Matter and Materials Physics Conference CMMP04, Warwick, UK,

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Item Type:Conference Proceedings
Keywords:Atomistic, Fluctuations, Impact, MOSFET, MOSFETS, Performance, Silicon
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Barker, Professor John and Watling, Dr Jeremy and Asenov, Professor Asen
Authors: Watling, J., Yang, L., Barker, J., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Publisher:Institute of Physics

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