Deposition of ammonia-free silicon nitride using inductively coupled plasma at low temperature

Zhou, H., Sim, C., Hodson, C., Kinsey, R. and Wilkinson, C. (2003) Deposition of ammonia-free silicon nitride using inductively coupled plasma at low temperature. In: 16th International Symposium on Plasma Chemistry, Sicily, Italy,

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Item Type:Conference Proceedings
Keywords:Chemistry, Nitride, Plasma, Silicon
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and Wilkinson, Professor Christopher
Authors: Zhou, H., Sim, C., Hodson, C., Kinsey, R., and Wilkinson, C.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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