Zhou, H., Sim, C., Hodson, C., Kinsey, R. and Wilkinson, C. (2003) Deposition of ammonia-free silicon nitride using inductively coupled plasma at low temperature. In: 16th International Symposium on Plasma Chemistry, Sicily, Italy,
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Item Type: | Conference Proceedings |
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Keywords: | Chemistry, Nitride, Plasma, Silicon |
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Zhou, Dr Haiping and Wilkinson, Professor Christopher |
Authors: | Zhou, H., Sim, C., Hodson, C., Kinsey, R., and Wilkinson, C. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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