Cao, X. and Thayne, I. (2003) High uniformity highly reproducible non-selective wet gate recess etch process for InP HEMT's. In: GaAs MANTECH, Scottsdale, USA,
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| Item Type: | Conference Proceedings |
|---|---|
| Keywords: | GAAS, Gate, HEMT, Inp |
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Thayne, Prof Iain |
| Authors: | Cao, X., and Thayne, I. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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