Cao, X. and Thayne, I. (2002) Novel high uniformity highly reproducible non-selective wet recess etch for InP HEMTs. In: Microelectronic and Nanoelectronic Engineering 2002, Lugano, Switzerland,
Full text not currently available from Enlighten.
Item Type: | Conference Proceedings |
---|---|
Keywords: | Engineering, GAAS, HEMT, HEMTS, INP, Inp HEMTS, PHEMTS |
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Thayne, Prof Iain |
Authors: | Cao, X., and Thayne, I. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
University Staff: Request a correction | Enlighten Editors: Update this record