Beyond SiO2 technology: The impact of high-k dielectrics

Ferrari, G., Watling, J., Roy, S., Barker, J. and Asenov, A. (2006) Beyond SiO2 technology: The impact of high-k dielectrics. In: 6th symposium SiO2 , advanced dielectrics and related devices : SiO2006, Palermo, Italy,

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Item Type:Conference Proceedings
Keywords:Device, Devices, Dielectrics, High-K, Impact, Technology
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Barker, Professor John and Asenov, Professor Asen and Watling, Dr Jeremy and Roy, Professor Scott
Authors: Ferrari, G., Watling, J., Roy, S., Barker, J., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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