Lasing Properties of Monolithically Integrated Ga(NAsP)/(BGa)P QW Lasers on a Silicon Substrate Grown by MOVPE

Hossain, N., Jin, S. R., Sweeney, S. J. , Liebich, S., Ludewig, P., Zimprich, M., Kunert, B., Volz, K. and Stolz, W. (2010) Lasing Properties of Monolithically Integrated Ga(NAsP)/(BGa)P QW Lasers on a Silicon Substrate Grown by MOVPE. In: 22nd IEEE International Semiconductor Laser Conference, Kyoto, Japan, 26-30 Sep 2010, pp. 109-110. ISBN 9781424456840 (doi: 10.1109/ISLC.2010.5642727)

Full text not currently available from Enlighten.

Abstract

Lasing operation up to 120K is reported for direct band-gap GaNAsP grown monolithically on a silicon substrate. Jth=0.81kAcm-2 is measured at 80K with a T0 of 97K from 40-120K for a HR coated device.

Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Sweeney, Professor Stephen
Authors: Hossain, N., Jin, S. R., Sweeney, S. J., Liebich, S., Ludewig, P., Zimprich, M., Kunert, B., Volz, K., and Stolz, W.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Conference Digest - IEEE International Semiconductor Laser Conference
ISSN:1947-6981
ISBN:9781424456840
Related URLs:

University Staff: Request a correction | Enlighten Editors: Update this record