Lever, L. et al. (2011) Modulation of the absorption coefficient at 1:3μm in Ge/SiGe multiple quantum well heterostructures on silicon. Optics Letters, 36(21), pp. 4158-4160. (doi: 10.1364/OL.36.004158) (PMID:22048350)
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Abstract
We report modulation of the absorption coefficient at 1.3 μm in Ge/SiGe multiple quantum well heterostructures on silicon via the quantum-confined Stark effect. Strain engineering was exploited to increase the direct optical bandgap in the Ge quantum wells. We grew 9 nm-thick Ge quantum wells on a relaxed Si0.22Ge0.78 buffer and a contrast in the absorption coefficient of a factor of greater than 3.2 was achieved in the spectral range 1290–1315 nm.
| Item Type: | Articles |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Marko, Dr Igor and Sweeney, Professor Stephen |
| Authors: | Lever, L., Hu, Y., Myronov, M., Liu, X., Owens, N., Gardes, F.Y., Marko, I.P., Sweeney, S.J., Ikonić, Z., Leadley, D.R., Reed, G.T., and Kelsall, R.W. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Journal Name: | Optics Letters |
| Publisher: | Optical Society of America |
| ISSN: | 0146-9592 |
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