Efficiency-limiting processes in Ga(NAsP)/GaP quantum well lasers

Hossain, N., Jin, S.R., Liebich, S., Zimprich, M., Volz, K., Kunert, B., Stolz, W. and Sweeney, S.J. (2012) Efficiency-limiting processes in Ga(NAsP)/GaP quantum well lasers. Applied Physics Letters, 101(1), 011107. (doi: 10.1063/1.4733312)

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Abstract

We report on the carrier recombination mechanisms in dilute nitride Ga(NAsP)/GaP quantum well lasers. Spontaneous emission measurements show that defect-related recombination in the devices is less significant compared with other GaAs-based dilute nitride lasers. From temperature dependent measurements, we find that the threshold current density, Jth is dominated by non-radiative recombination process(es), which account for at least 91% of Jth at room temperature. The characteristic temperature, T0 (T1) is measured to be ∼104 K (∼99 K) around 200 K, which drops to ∼58 K ( ∼37 K) around room temperature. Hydrostatic pressure measurements reveal a strong increase of threshold current with increasing pressure. This implies that current leakage dominates carrier recombination which is also responsible for their low T0 and T1 values at room temperature.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Sweeney, Professor Stephen
Authors: Hossain, N., Jin, S.R., Liebich, S., Zimprich, M., Volz, K., Kunert, B., Stolz, W., and Sweeney, S.J.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Applied Physics Letters
Publisher:American Institute of Physics
ISSN:0003-6951
ISSN (Online):1077-3118
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