Deterministic nanoscale quantum spin-defect implantation and diffraction strain imaging

Delegan, N., Whiteley, S. J., Zhou, T., Bayliss, S. L. , Titze, M., Bielejec, E., Holt, M. V., Awschalom, D. D. and Heremans, F. J. (2023) Deterministic nanoscale quantum spin-defect implantation and diffraction strain imaging. Nanotechnology, 34(38), 385001. (doi: 10.1088/1361-6528/acdd09)

Abstract

Local crystallographic features negatively affect quantum spin defects by changing the local electrostatic environment, often resulting in degraded or varied qubit optical and coherence properties. Few tools exist that enable the deterministic synthesis and study of such intricate systems on the nano-scale, making defect-to-defect strain environment quantification difficult. In this paper, we highlight state-of-the-art capabilities from the U.S. Department of Energy's Nanoscale Science Research Centers that directly address these shortcomings. Specifically, we demonstrate how complementary capabilities of nano-implantation and nano-diffraction can be used to demonstrate the quantum relevant, spatially deterministic creation of neutral divacancy centers in 4H silicon carbide, while investigating and characterizing these systems on the $\leqslant 25\,{\rm{nm}}$ scale with strain sensitivities on the order of $1\times {10}^{-6},$ relevant to defect formation dynamics. This work lays the foundation for ongoing studies into the dynamics and deterministic formation of low strain homogeneous quantum relevant spin defects in the solid state.

• Item Type: Articles
• Additional Information: SLB acknowledges support from UK Research and Innovation [Grant: MR/W006928/1].
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Bayliss, Dr Sam
• Authors: Delegan, N., Whiteley, S. J., Zhou, T., Bayliss, S. L., Titze, M., Bielejec, E., Holt, M. V., Awschalom, D. D., and Heremans, F. J.
• College/School: College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
• Journal Name: Nanotechnology
• Publisher: IOP Publishing
• ISSN: 0957-4484
• ISSN (Online): 1361-6528
• Published Online: 03 July 2023
• Copyright Holders: Copyright © 2023 The Authors
• First Published: First published in Nanotechnology 34(38): 385001
• Publisher Policy: Reproduced under a Creative Commons License
• Data DOI: 10.5281/zenodo.7706607