Micro-machined deep silicon atomic vapor cells

Dyer, S., Griffin, P. F., Arnold, A. S., Mirando, F., Burt, D. P., Riis, E. and McGilligan, J. P. (2022) Micro-machined deep silicon atomic vapor cells. Journal of Applied Physics, 132, 134401. (doi: 10.1063/5.0114762)

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Abstract

Using a simple and cost-effective water jet process, silicon etch depth limitations are overcome to realize a 6 mm deep atomic vapor cell. While the minimum silicon feature size was limited to a 1.5 mm width in these first generation vapor cells, we successfully demonstrate a two-chamber geometry by including a ∼25 mm meandering channel between the alkali pill chamber and the main interrogation chamber. We evaluate the impact of the channel conductance on the introduction of the alkali vapor density during the pill activation process and mitigate glass damage and pill contamination near the main chamber. Finally, we highlight the improved signal achievable in the 6 mm silicon cell compared to standard 2 mm path length silicon vapor cells.

Item Type:Articles
Additional Information:The authors acknowledge funding from Innovate UK (Project No. 50133). J.P.M. gratefully acknowledges funding from the Royal Academy of Engineering Research Fellowship.
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Mirando, Mr Francesco and Burt, Dr David
Authors: Dyer, S., Griffin, P. F., Arnold, A. S., Mirando, F., Burt, D. P., Riis, E., and McGilligan, J. P.
College/School:College of Science and Engineering > School of Engineering
Journal Name:Journal of Applied Physics
Publisher:American Institute of Physics
ISSN:0021-8979
ISSN (Online):1089-7550
Published Online:03 October 2022
Copyright Holders:Copyright © 2022 Author(s)
First Published:First published in Journal of Applied Physics 132: 134401
Publisher Policy:Reproduced under a Creative Commons License

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
310444DISCOVERY: Developing UK Industrial Supply for Commercial Quantum ComputingDouglas PaulInnovate UK (INNOVATE)50133ENG - Electronics & Nanoscale Engineering