Robust sub-100 nm T-gate fabrication process using multi-step development

Karami, K. , Dhongde, A., Cheng, H., Reynolds, P. M. , Thoms, S. , Reddy, B. A., Ritter, D., Li, C. and Wasige, E. (2022) Robust sub-100 nm T-gate fabrication process using multi-step development. MNE EUROSENSORS 2022, Leuven, Belgium, 19-23 September 2022.

Abstract

No abstract available.

• Item Type: Conference or Workshop Item
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Wasige, Professor Edward and Thoms, Dr Stephen and Dhongde, Aniket and CHENG, Huihua and Karami, Mr Kaivan and Li, Professor Chong and Reynolds, Dr Paul
• Authors: Karami, K., Dhongde, A., Cheng, H., Reynolds, P. M., Thoms, S., Reddy, B. A., Ritter, D., Li, C., and Wasige, E.
• College/School: College of Science and Engineering > School of Engineering; College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering