Polarization-pinning in substrate emission multi-mode vertical-cavity surface-emitting lasers using deep trenches

Lei, D., Kim, D.-H. , Babazadeh, N., Childs, D. T.D. and Hogg, R. A. (2022) Polarization-pinning in substrate emission multi-mode vertical-cavity surface-emitting lasers using deep trenches. Applied Physics Letters, 120(21), 211102. (doi: 10.1063/5.0087166)

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Abstract

We investigated the stable polarization-pinning properties of substrate emission InGaAs-based 980 nm multi-mode vertical-cavity surfaceemitting lasers (VCSELs). For the multi-mode 40 um diameter aperture VCSELs, we introduced 30 lm wide, 9 lm depth deep trenches that are 15 lm away from the cavity aperture. The VCSELs with trench structure produced higher transverse-electric (TE) polarized light output power, as compared with transverse-magnetic (TM) polarized light output power, namely, the effective TM polarization suppression was realized. These trench-etched VCSELs exhibited a 7.5 dB orthogonal polarization suppression ratio with 16.8 mW of light output power at 60 mA of current injection. The dominant TE polarization distribution was observed in polarization-resolved near-field images of spontaneous and stimulated emission due to the induced strain by the etched trenches.

Item Type:Articles
Additional Information:This work was supported through the Engineering and Physical Sciences Research Council (EPSRC) of U.K. (No. EP/M015165/1).
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Kim, Dr Daehyun and LEI, Danqi and Childs, Dr David and Hogg, Professor Richard
Authors: Lei, D., Kim, D.-H., Babazadeh, N., Childs, D. T.D., and Hogg, R. A.
College/School:College of Science and Engineering
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Applied Physics Letters
Publisher:American Institute of Physics
ISSN:0003-6951
ISSN (Online):1077-3118
Copyright Holders:Copyright © 2022 The Authors
First Published:First published in Applied Physics Letters 120(21): 211102
Publisher Policy:Reproduced under a Creative Commons License

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
172966Ultrafast Laser Plasma Implantation: Seamless Integration of Functional Materials for Advanced Photonics (SeaMatics)Richard HoggEngineering and Physical Sciences Research Council (EPSRC)EP/M015165/1ENG - Electronics & Nanoscale Engineering