Borgatti, F., Bergenti, I., Bona, F., Dediu, V., Fondacaro, A., Huotari, S., Monaco, G., MacLaren, D.A., Chapman, J.N. and Panaccione, G. (2010) Understanding the role of tunneling barriers in organic spin valves by hard x-ray photoelectron spectroscopy. Applied Physics Letters, 96, 043306. (doi: 10.1063/1.3285179)
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Abstract
We present an ex situ, nondestructive chemical characterization of deeply buried organic-inorganic interfaces using hard x-ray photoelectron spectroscopy. Co/Alq<sub>3</sub> and Co/AlO<sub>x</sub>/Alq<sub>3</sub> interfaces were studied in order to determine the role of a thin (1–2 nm) AlO<sub>x</sub> interdiffusion barrier in organic spin valves. Interfacial Alq<sub>3</sub>, 15 nm below the surface, exhibits strong sensitivity to the electronic structure of the interfacial region and to the presence of the AlO<sub>x</sub>. In addition to reducing Co–Alq<sub>3</sub> interdiffusion, we find that the barrier prevents charge donation from the Co to the interfacial Alq<sub>3</sub>, thus preventing the formation of Alq<sub>3</sub> anions within the interface region.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | MacLaren, Professor Donald and Chapman, Professor John |
Authors: | Borgatti, F., Bergenti, I., Bona, F., Dediu, V., Fondacaro, A., Huotari, S., Monaco, G., MacLaren, D.A., Chapman, J.N., and Panaccione, G. |
Subjects: | Q Science > QC Physics |
College/School: | College of Science and Engineering > School of Physics and Astronomy |
Journal Name: | Applied Physics Letters |
Journal Abbr.: | Appl. Phys. Lett. |
ISSN: | 0003-6951 |
ISSN (Online): | 1077-3118 |
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