Fabrication of high Q square-lattice photonic crystal microcavities

Hennessy, K., Reese, C., Badolato, A. , Wang, C. F., Imamoglu, A., Petroff, P. M. and Hu, E. (2003) Fabrication of high Q square-lattice photonic crystal microcavities. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 21(6), pp. 2918-2921. (doi: 10.1116/1.1629298)

Full text not currently available from Enlighten.

Abstract

This work discusses the fabrication of two-dimensional photonic crystal microcavities (PCMs) in a thin GaAs membrane. We have developed a fabrication process for square-lattice, single-hole-defect devices, a class of PCMs that is critically sensitive to fabrication accuracy, demonstrated coupling of InAs quantum dots to the cavity modes, and shown the sensitivity of the emission to the quality of the fabrication process. Reactive ion etching conditions were optimized to produce photonic crystal holes with smooth, straight sidewalls. To achieve uniform hole sizes throughout the device, we developed a method to correct the proximity effect introduced while defining the photonic crystal holes using electron-beam lithography. Resulting cavities have resonances with quality factors as high as 4000, which proves the quality of our fabrication.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Badolato, Professor Antonio
Authors: Hennessy, K., Reese, C., Badolato, A., Wang, C. F., Imamoglu, A., Petroff, P. M., and Hu, E.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Publisher:American Institute of Physics
ISSN:2166-2746
ISSN (Online):2166-2754
Published Online:09 October 2003

University Staff: Request a correction | Enlighten Editors: Update this record