Stoltz, N. G., Rakher, M., Strauf, S., Badolato, A. , Lofgreen, D. D., Petroff, P. M., Coldren, L. A. and Bouwmeester, D. (2005) High-quality factor optical microcavities using oxide apertured micropillars. Applied Physics Letters, 87, 031105. (doi: 10.1063/1.1999843)
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Abstract
An oxide aperture is used to confine optical modes in a micropillar structure. This method overcomes the limitations due to sidewall scattering loss typical in semiconductor etched micropillars. High cavity quality factors (Q) up to 48 000 are determined by external Fabry–Perot cavity scanning measurements, a significantly higher value than prior work in III-V etched micropillars. Measured Q values and estimated mode volumes correspond to a maximum Purcell factor figure of merit value of 72.
| Item Type: | Articles |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Badolato, Professor Antonio |
| Authors: | Stoltz, N. G., Rakher, M., Strauf, S., Badolato, A., Lofgreen, D. D., Petroff, P. M., Coldren, L. A., and Bouwmeester, D. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Journal Name: | Applied Physics Letters |
| Publisher: | American Institute of Physics |
| ISSN: | 0003-6951 |
| ISSN (Online): | 1077-3118 |
| Published Online: | 12 July 2005 |
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