Kettle, J., Hoyle, R.T., Dimov, S. and Perks, R.M. (2008) Fabrication of complex 3D structures using Step and Flash Imprint Lithography (S-FIL). Microelectronic Engineering, 85(5-6), pp. 853-855. (doi: 10.1016/j.mee.2007.12.003)
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Abstract
In this paper, the use of Focused Ion Beam (FIB) milling as an alternative technology to electron-beam lithography in production of complex 3-D-structures such as “Motheye” lenses for Step and Flash Imprint Lithography (S–FIL) templates is discussed. Alterations introduced to conventional template fabrication techniques and the advantages and disadvantages of the proposed template fabrication method over conventional routes are discussed. Comparing the template and replication, we show that the surface topographies are almost identical, and thus FIB milled structures can be consistently replicated employing the S–FIL technology.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Kettle, Professor Jeff |
Authors: | Kettle, J., Hoyle, R.T., Dimov, S., and Perks, R.M. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | Microelectronic Engineering |
Publisher: | Elsevier |
ISSN: | 0167-9317 |
ISSN (Online): | 1873-5568 |
Published Online: | 08 January 2008 |
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