Non-destructive mapping of doping and structural composition of MOVPE-grown high current density resonant tunnelling diodes through photoluminescence spectroscopy

Jacobs, K.J.P., Stevens, B.J., Mukai, T., Ohnishi, D. and Hogg, R. A. (2015) Non-destructive mapping of doping and structural composition of MOVPE-grown high current density resonant tunnelling diodes through photoluminescence spectroscopy. Journal of Crystal Growth, 418, pp. 102-110. (doi: 10.1016/j.jcrysgro.2015.02.017)

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Abstract

We report on photoluminescence (PL) characterisation of metal-organic vapour phase epitaxy (MOVPE) grown high current density (~700 kA/cm2) InGaAs/AlAs/InP based resonant tunnelling diodes (RTDs) for terahertz emission. The PL mapping we describe allows important information about doping level and uniformity, ternary alloy composition and uniformity, and uniformity of quantum well thickness to be deduced. PL as a function of doping concentration is studied for InGaAs test layers at low temperatures and correlated to secondary-ion mass spectroscopy (SIMS) and electrochemical capacitance–voltage (eCV) profiling to provide non-destructive mapping of doping over the wafer. For the RTD structures, we utilise eCV as a selective etch tool to identify the origin of low temperature PL emission from the quantum well (QW) and the highly doped contact layers. PL mapping of the RTD wafer at low temperatures is shown to allow the assessment of variations in InGaAs alloy composition and QW thickness. Details of the growth process are discussed and confirmed using high resolution X-ray diffraction (HRXRD) crystallography. The rapid non-destructive characterisation and wafer mapping of these structures promises a route to future growth optimisation of such structures.

Item Type:Articles
Additional Information:We gratefully acknowledge D. T. D. Childs and Prof. O. Wada for fruitful discussions and the U.K. Engineering & Physical Sciences Research Council for financial support.
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Hogg, Professor Richard
Authors: Jacobs, K.J.P., Stevens, B.J., Mukai, T., Ohnishi, D., and Hogg, R. A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Crystal Growth
Publisher:Elsevier
ISSN:0022-0248
ISSN (Online):1873-5002
Published Online:13 February 2015

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