W-band on Wafer Measurement of Active and Passive Devices

Edgar, D.L. , Elgaid, K. , Williamson, F. , Ross, A. , McLelland, H. , Ferguson, S. , Doherty, F. , Thayne, I.G. , Taylor, M.R.S. and Beaumont, S.P. (1999) W-band on Wafer Measurement of Active and Passive Devices. In: IEE Colloquium on Microwave Measurements: Current Techniques and Trends, London, UK, 23 Feb 1999, 2/1-2/6. (doi:10.1049/ic:19990025)

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In this paper we have presented a study of the effect of back-thinning standard CPW wafers and the influence on measured W-band performance. Improvements in measured insertion loss and substrate cross-talk have been observed, and a study of the effect of a quartz spacer layer has been made. Additionally, the improvement in measured performance of active devices after wafer thinning has also been shown, and further progress is expected in this area.

Item Type:Conference Proceedings
Additional Information:Conference number: 1999/008.
Glasgow Author(s) Enlighten ID:Ferguson, Mrs Susan and Thayne, Professor Iain and McLelland, Mrs Helen and Beaumont, Professor Steve and Doherty, Mr Frederick and Elgaid, Dr Khaled
Authors: Edgar, D.L., Elgaid, K., Williamson, F., Ross, A., McLelland, H., Ferguson, S., Doherty, F., Thayne, I.G., Taylor, M.R.S., and Beaumont, S.P.
College/School:College of Science and Engineering > School of Engineering
College of Science and Engineering > School of Physics and Astronomy

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