Webster, R. W.H., Scott, M.T., Popuri, S.R., Bos, J.W.G. and MacLaren, D. A. (2020) Epitaxial vanadium nanolayers to suppress interfacial reactions during deposition of titanium-bearing Heusler alloys on MgO(001). Applied Surface Science, 512, 145649. (doi: 10.1016/j.apsusc.2020.145649)
|
Text
209339.pdf - Published Version Available under License Creative Commons Attribution. 4MB |
Abstract
Epitaxial growth of the half-Heusler alloy TiNiSn onto (1 0 0)-oriented MgO is compromised by interfacial reactions driven by the oxidising potential of titanium. Here, we demonstrate that a few epitaxial monolayers of elemental vanadium are sufficient to act as an impermeable buffer that maintains epitaxy and stoichiometric thin film growth but suppresses interfacial oxidation of the alloy. Electron diffraction and microscopy are used to characterise the thin film morphologies and thereby determine the optimum deposition conditions. Electron energy loss spectroscopy is used to demonstrate the chemical nature of the resulting thin film interfaces and confirms that TiNiSn film quality is improved.
| Item Type: | Articles |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | MacLaren, Professor Donald and Webster, Mr Robert |
| Authors: | Webster, R. W.H., Scott, M.T., Popuri, S.R., Bos, J.W.G., and MacLaren, D. A. |
| College/School: | College of Science and Engineering > School of Physics and Astronomy |
| Journal Name: | Applied Surface Science |
| Publisher: | Elsevier |
| ISSN: | 0169-4332 |
| ISSN (Online): | 1873-5584 |
| Published Online: | 04 February 2020 |
| Copyright Holders: | Copyright © 2020 The Authors |
| First Published: | First published in Applied Surface Science 512:145649 |
| Publisher Policy: | Reproduced under a Creative Commons license |
University Staff: Request a correction | Enlighten Editors: Update this record
Altmetric
Altmetric