Porosification-reduced optical trapping of silicon nanostructures

To, W.-K., Fu, J., Yang, X., Roy, V.A.L. and Huang, Z. (2012) Porosification-reduced optical trapping of silicon nanostructures. Nanoscale, 4(19), pp. 5835-5839. (doi: 10.1039/c2nr31680c)

Abstract

Metal-assisted chemical etching (MACE) was carried out to fabricate solid silicon nanowires (s-SiNWs) and mesoporous silicon nanowires (mp-SiNWs). Total reflection and transmission were measured using an integrated sphere to study optical properties of the MACE-generated silicon nanostructures. Without NW aggregation, mp-SiNWs vertically standing on a mesoporous silicon layer trap less light than s-SiNWs over a wavelength range of 400–800 nm, owing to porosification-enhanced optical scattering from the rough inner surfaces of the mesoporous silicon skeletons. Porosification substantially weakens the NW mechanical strength; hence the elongated mp-SiNWs aggregate after 30 min etching and deteriorate optical trapping.

• Item Type: Articles
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Vellaisamy, Professor Roy
• Authors: To, W.-K., Fu, J., Yang, X., Roy, V.A.L., and Huang, Z.
• College/School: College of Science and Engineering > School of Engineering
• Journal Name: Nanoscale
• Publisher: Royal Society of Chemistry
• ISSN: 2040-3364
• ISSN (Online): 2040-3372
• Published Online: 03 August 2012