Porosification-reduced optical trapping of silicon nanostructures

To, W.-K., Fu, J., Yang, X., Roy, V.A.L. and Huang, Z. (2012) Porosification-reduced optical trapping of silicon nanostructures. Nanoscale, 4(19), pp. 5835-5839. (doi: 10.1039/c2nr31680c)

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Metal-assisted chemical etching (MACE) was carried out to fabricate solid silicon nanowires (s-SiNWs) and mesoporous silicon nanowires (mp-SiNWs). Total reflection and transmission were measured using an integrated sphere to study optical properties of the MACE-generated silicon nanostructures. Without NW aggregation, mp-SiNWs vertically standing on a mesoporous silicon layer trap less light than s-SiNWs over a wavelength range of 400–800 nm, owing to porosification-enhanced optical scattering from the rough inner surfaces of the mesoporous silicon skeletons. Porosification substantially weakens the NW mechanical strength; hence the elongated mp-SiNWs aggregate after 30 min etching and deteriorate optical trapping.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Vellaisamy, Professor Roy
Authors: To, W.-K., Fu, J., Yang, X., Roy, V.A.L., and Huang, Z.
College/School:College of Science and Engineering > School of Engineering
Journal Name:Nanoscale
Publisher:Royal Society of Chemistry
ISSN (Online):2040-3372
Published Online:03 August 2012

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