Surface engineering of reduced graphene oxide for controllable ambipolar flash memories

Han, S.-T., Zhou, Y., Sonar, P., Wei, H., Zhou, L., Yan, Y., Lee, C.-S. and Roy, V.A.L. (2015) Surface engineering of reduced graphene oxide for controllable ambipolar flash memories. ACS Applied Materials and Interfaces, 7(3), pp. 1699-1708. (doi: 10.1021/am5072833) (PMID:25537669)

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Abstract

Tunable charge-trapping behaviors including unipolar charge trapping of one type of charge carrier and ambipolar trapping of both electrons and holes in a complementary manner is highly desirable for low power consumption multibit flash memory design. Here, we adopt a strategy of tuning the Fermi level of reduced graphene oxide (rGO) through self-assembled monolayer (SAM) functionalization and form p-type and n-type doped rGO with a wide range of manipulation on work function. The functionalized rGO can act as charge-trapping layer in ambipolar flash memories, and a dramatic transition of charging behavior from unipolar trapping of electrons to ambipolar trapping and eventually to unipolar trapping of holes was achieved. Adjustable hole/electron injection barriers induce controllable Vth shift in the memory transistor after programming operation. Finally, we transfer the ambipolar memory on flexible substrates and study their charge-trapping properties at various bending cycles. The SAM-functionalized rGO can be a promising candidate for next-generation nonvolatile memories.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Vellaisamy, Professor Roy
Authors: Han, S.-T., Zhou, Y., Sonar, P., Wei, H., Zhou, L., Yan, Y., Lee, C.-S., and Roy, V.A.L.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:ACS Applied Materials and Interfaces
Publisher:American Chemical Society
ISSN:1944-8244
ISSN (Online):1944-8252
Published Online:13 January 2015
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