Interface engineering via photopolymerization-induced phase separation for flexible UV-responsive phototransistors

Peng, H. et al. (2018) Interface engineering via photopolymerization-induced phase separation for flexible UV-responsive phototransistors. ACS Applied Materials and Interfaces, 10(8), pp. 7487-7496. (doi: 10.1021/acsami.7b19371) (PMID:29411961)

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Interface engineering has been recognized to be substantially critical for achieving efficient charge separation, charge carrier transport, and enhanced device performance in emerging optoelectronics. Nevertheless, precise control of the interface structure using current techniques remains a formidable challenge. Herein, we demonstrate a facile and versatile protocol wherein in situ thiol–ene click photopolymerization-induced phase separation is implemented for constructing heterojunction semiconductor interfaces. This approach generates continuous mountainlike heterojunction interfaces that favor efficient exciton dissociation at the interface while providing a continuous conductive area for hole transport above the interface. This facile low-temperature paradigm presents good adaptability to both rigid and flexible substrates, offering high-performance UV-responsive phototransistors with a normalized detectivity up to 6.3 × 1014 cm Hz1/2 W–1 (also called jones). Control experiments based on ex situ photopolymerization and in situ thermal polymerization are also implemented to demonstrate the superiority of this novel paradigm.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Vellaisamy, Professor Roy
Authors: Peng, H., Yan, Y., Yang, Y., Zhou, L., Wu, W., Sun, Q., Zhuang, J., Han, S.-T., Ko, C.-C., Xu, Z., Xie, X., Li, R. K. Y., and Roy, V. A. L.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:ACS Applied Materials and Interfaces
Publisher:American Chemical Society
ISSN (Online):1944-8252
Published Online:07 February 2018
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