High-gyrotropy seedlayer-free Ce:TbIG for monolithic laser-matched SOI optical isolators

Srinivasan, K., Zhang, C., Dulal, P., Radu, C., Gage, T. E., Hutchings, D. C. and Stadler, B. J.H. (2019) High-gyrotropy seedlayer-free Ce:TbIG for monolithic laser-matched SOI optical isolators. ACS Photonics, 6, pp. 2455-2461. (doi: 10.1021/acsphotonics.9b00707)

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Monolithic optical isolators that provide modal (transverse electric, TE) and dimensional (500 nm core) matching to on-chip lasers have been realized with “one step” seedlayer-free garnets. To date, seedlayer-free garnet claddings have required thinner (< 340 nm) silicon-on-insulator (SOI) cores because mode-cladding interactions were too weak for laser-matched cores. However, laser matching is important because tapers, and/or mode converters between the laser and the isolator can cause detrimental reflections prior to isolation. This paper reports the use of cerium-doped terbium iron garnet (Ce:TbIG) in a quasi-phase matched non-reciprocal mode conversion (NRMC) isolator that operates on both TE and TM modes. A key innovation presented here is a repeatable process for foundry-friendly sputter deposition of Ce:TbIG, which enables this high Faraday rotation material (-3200°/cm) to be synthesized in any isolator design that would benefit from one-step lithographical manufacturing. A proof-of-feasibility 500 nm-SOI NRMC device is demonstrated with seedlayer-free Ce:TbIG that achieves an isolation ratio of 11 dB. With an optimal length, this NRMC design can provide greater than 30 dB isolation.

Item Type:Articles
Additional Information:This research was sponsored as a World Materials Network project by the U.S. National Science Foundation (DMR-1210818) and the U.K. Engineering and Physical Sciences Research Council (EP/J018708/1) and also supported by the China Scholarship Council. Parts of this work were carried out in the Characterization Facility and the Minnesota Nano Center, University of Minnesota, which receives partial support from the NSF through the MRSEC and the National Nano Coordinated Infrastructure Network (NNCI Award Number 1542202) programs, respectively. The authors acknowledge the valuable support of waveguide patterning by the technical staff of the James Watt Nanofabrication Centre. Useful discussions with Dr. Barry Holmes are acknowledged by the authors.
Glasgow Author(s) Enlighten ID:Hutchings, Professor David and Zhang, Miss Cui
Authors: Srinivasan, K., Zhang, C., Dulal, P., Radu, C., Gage, T. E., Hutchings, D. C., and Stadler, B. J.H.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:ACS Photonics
Publisher:American Chemical Society
ISSN (Online):2330-4022
Published Online:06 September 2019
Copyright Holders:Copyright © 2019 American Chemical Society
First Published:First published in ACS Photonics 6:2455-2461
Publisher Policy:Reproduced in accordance with the publisher copyright policy

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
594681Materials World Network: Complex oxides for heterogeneous optoelectronic integrationDavid HutchingsEngineering and Physical Sciences Research Council (EPSRC)EP/J018708/1ENG - ENGINEERING ELECTRONICS & NANO ENG