Carrillo-Nunez, H., Dimitrova, N., Asenov, A. and Georgiev, V. (2019) Machine learning approach for predicting the effect of statistical variability in Si junctionless nanowire transistors. IEEE Electron Device Letters, 40(9), pp. 1366-1369. (doi: 10.1109/LED.2019.2931839)
|
Text
191552.pdf - Accepted Version 759kB |
Abstract
This work investigates the possibility to replace numerical TCAD device simulations with a multi-layer neural network (NN). We explore if it is possible to train the NN with the required accuracy in order to predict device characteristics of thousands of transistors without executing TCAD simulations. In order to answer this question, here we present a hierarchical multi-scale simulation study of a silicon junctionless nanowire field-effect transistor (JL-NWT) with a gate length of 150 nm and diameter of an Si channel of 8 nm. All device simulations are based on the Drift-Diffusion (DD) formalism with activated density gradient (DG) quantum corrections. For the purpose of this work, we perform statistical numerical experiments of a set of 1380 automictically different JL-NWTs. Each device has a unique random distribution of discrete dopants (RDD) within the silicon body. From those statistical simulations, we extract important figures of merit (FoM), such as OFF-current (IOFF) and ONcurrent (ION), subthreshold slope (SS) and voltage threshold (VTH). Based on those statistical simulations, we train a multi-layer NN and we compare the obtained results with a general linear model (GLM). Our work shows the potential of using NN in the field of device modelling and simulation with a potential application to significantly reduce the computational cost.
Item Type: | Articles |
---|---|
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Dimitrova, Miss Nadezhda and Carrillo-Nunez, Dr Hamilton and Asenov, Professor Asen and Georgiev, Professor Vihar |
Authors: | Carrillo-Nunez, H., Dimitrova, N., Asenov, A., and Georgiev, V. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | IEEE Electron Device Letters |
Publisher: | IEEE |
ISSN: | 0741-3106 |
ISSN (Online): | 1558-0563 |
Published Online: | 29 July 2019 |
Copyright Holders: | Copyright © 2019 IEEE |
First Published: | First published in IEEE Electron Device Letters 40(9): 1366-1369 |
Publisher Policy: | Reproduced in accordance with the copyright policy of the publisher |
University Staff: Request a correction | Enlighten Editors: Update this record