Ternent, G. and Paul, D. J. (2013) Si/SiGe tunneling static random access memories. ECS Transactions, 50(9), pp. 987-990. (doi: 10.1149/05009.0987ecst)
Full text not currently available from Enlighten.
Abstract
One of the limits to the low power operation of MOSFET devices is the minimum subthreshold slope defined by the p-n junctions in the devices. A tunneling static random access memory is demonstrated with a supply voltage of 0.42 V, well below the minimum supply voltage that MOSFET technology is capable of delivering. The memory is produced using two Si/SiGe resonant tunneling diodes with peak voltages of 0.175 V fabricated on top of a silicon substrate.
Item Type: | Articles |
---|---|
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Paul, Professor Douglas |
Authors: | Ternent, G., and Paul, D. J. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Research Group: | Semiconductor Devices |
Journal Name: | ECS Transactions |
Publisher: | Electrochemical Society |
ISSN: | 1938-5862 |
ISSN (Online): | 1938-6737 |
University Staff: Request a correction | Enlighten Editors: Update this record