Li, X. , Floros, K., Cho, S.-J., Hemakumara, D., Guiney, I., Moran, D. and Thayne, I. G. (2016) An Hbr/Ar Atomic Layer Etch Process for Precision Gate Recess Etching of Gan-Based Transistors. UKNC Winter Conference 2016, Cambridge, UK, 6-7 Jan 2016.
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Abstract
No abstract available.
Item Type: | Conference or Workshop Item |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Li, Dr Xu and Cho, Dr Sung-Jin and Thayne, Prof Iain and Moran, Professor David and Hemakumara, Miss Dilini |
Authors: | Li, X., Floros, K., Cho, S.-J., Hemakumara, D., Guiney, I., Moran, D., and Thayne, I. G. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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