Zhou, H., Fu, Y.-C., Mirza, M. M.A. and Li, X. (2018) Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 and HfO2 Films Investigated by Using in situ Auger Electron Spectroscopy. AVS 18th International Conference on Atomic Layer Deposition (ALD) Featuring the 5th International Atomic Layer Etching Workshop (ALE), Incheon, Korea, 29 Jul - 01 Aug 2018.
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Publisher's URL: https://ald2018.avs.org/
Abstract
No abstract available.
Item Type: | Conference or Workshop Item |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Mirza, Dr Muhammad M A and Zhou, Dr Haiping and Fu, Mr Yen-Chun and Li, Dr Xu |
Authors: | Zhou, H., Fu, Y.-C., Mirza, M. M.A., and Li, X. |
Subjects: | Q Science > QC Physics |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Research Group: | AVS |
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