Optimization of HNO3 leaching of copper from old AMD Athlon processors using response surface methodology

Javed, U., Farooq, R., Shehzad, F. and Khan, Z. (2018) Optimization of HNO3 leaching of copper from old AMD Athlon processors using response surface methodology. Journal of Environmental Management, 211(1), pp. 22-27. (doi: 10.1016/j.jenvman.2018.01.026) (PMID:29408070)

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The present study investigates the optimization of HNO leaching of Cu from old AMD Athlon processors under the effect of nitric acid concentration (%), temperature (°C) and ultrasonic power (W). The optimization study is carried out using response surface methodology with central composite rotatable design (CCRD). The ANOVA study concludes that the second degree polynomial model is fitted well to the fifteen experimental runs based on p-value (0.003), R (0.97) and Adj-R (0.914). The study shows that the temperature is the most significant process variable to the leaching concentration of Cu followed by nitric acid concentration. However, ultrasound power shows no significant impact on the leaching concentration. The optimum conditions were found to be 20% nitric acid concentration, 48.89 °C temperature and 5.52 W ultrasound power for attaining maximum concentration of 97.916 mg/l for Cu leaching in solution.

Item Type:Articles
Keywords:Copper, Leaching, Nitric acid, Response surface methodology
Glasgow Author(s) Enlighten ID:Khan, Dr Zakir
Authors: Javed, U., Farooq, R., Shehzad, F., and Khan, Z.
College/School:College of Science and Engineering > School of Engineering > Systems Power and Energy
Journal Name:Journal of Environmental Management
ISSN (Online):1095-8630
Published Online:02 February 2018
Copyright Holders:Copyright © 2018 Elsevier
First Published:First published in Journal of Environmental Management 211(1):22-27
Publisher Policy:Reproduced in accordance with the copyright policy of the publisher

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