Fabrication of high quality ferromagnetic Josephson junctions

Weides, M. , Tillmann, K. and Kohlstedt, H. (2006) Fabrication of high quality ferromagnetic Josephson junctions. Physica C: Superconductivity, 437-38, pp. 349-352. (doi: 10.1016/j.physc.2005.12.046)

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Abstract

We present ferromagnetic Nb/Al2O3/Ni60Cu40/Nb Josephson junctions (SIFS) with an ultrathin Al2O3 tunnel barrier. The junction fabrication was optimized regarding junction insulation and homogeneity of current transport. Using ion-beam-etching and anodic oxidation we defined and insulated the junction mesas. The additional 2 nm thin Cu-layer below the ferromagnetic NiCu (SINFS) lowered interface roughness and ensured very homogeneous current transport. A high yield of junctional devices with jc spreads less than 2% was obtained.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Weides, Professor Martin
Authors: Weides, M., Tillmann, K., and Kohlstedt, H.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Physica C: Superconductivity
Publisher:Elsevier
ISSN:0921-4534
ISSN (Online):1873-2143
Published Online:26 January 2006

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