Degeneracy and high doping effects in deep sub-micron relaxed and strained SiGe MOSFETs

Watling, J. (2003) Degeneracy and high doping effects in deep sub-micron relaxed and strained SiGe MOSFETs. Journal of Computational Electronics, 2(39540), pp. 475-479.

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Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Watling, Dr Jeremy
Authors: Watling, J.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Computational Electronics

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