Non-equilibrium dielectric response of high-k gate stacks in Si MOSFETs: application to SO interface phonon scattering

Watling, J. (2006) Non-equilibrium dielectric response of high-k gate stacks in Si MOSFETs: application to SO interface phonon scattering. Journal of Physics: Conference Series, 35(1), pp. 255-268. (doi: 10.1088/1742-6596/35/1/023)

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Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Watling, Dr Jeremy
Authors: Watling, J.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Physics: Conference Series
Publisher:Institute of Physics Publishing Ltd.
ISSN:1742-6588

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