Watling, J. (2003) Simulations of scaled sub-100nm strained Si/SiGe p-channel MOSFETs. Journal of Computational Electronics, 2(39540), pp. 363-368.
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Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Watling, Dr Jeremy |
Authors: | Watling, J. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | Journal of Computational Electronics |
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