Macintyre, D. and Thoms, S. (2005) A study of resist flow during nanoimprint lithography. Microelectronic Engineering, 78-79, pp. 670-675. (doi: 10.1016/j.mee.2004.12.083)
Full text not currently available from Enlighten.
Item Type: | Articles |
---|---|
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Thoms, Dr Stephen and Macintyre, Dr Douglas |
Authors: | Macintyre, D., and Thoms, S. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | Microelectronic Engineering |
University Staff: Request a correction | Enlighten Editors: Update this record