Photosensitive materials for integrated optic applications

Marques, P.V.S., Moreira, P.J., Alexandre, D., Melo, M., Schmidt, T.E.A., Muenzner, R., Leite, A.M.P. and Aitchison, J.S. (2005) Photosensitive materials for integrated optic applications. Fiber and Integrated Optics, 24, pp. 149-169. (doi: 10.1080/01468030590922696)

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Abstract

This article presents results of device fabrication using UV processing of materials and integrated optic components produced by flame hydrolysis deposition and hybrid sol-gel technology. Photosensitive materials were employed in the fabrication of channel waveguides and channel photo-imprinted waveguides incorporating Bragg gratings through single and double-step exposure.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:UNSPECIFIED
Authors: Marques, P.V.S., Moreira, P.J., Alexandre, D., Melo, M., Schmidt, T.E.A., Muenzner, R., Leite, A.M.P., and Aitchison, J.S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Fiber and Integrated Optics

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