Floros, K., Li, X. , Guiney, I., Cho, S.-J., Hemakumara, D., Wallis, D. J., Wasige, E. , Moran, D. A.J. , Humphreys, C. J. and Thayne, I. G. (2017) Dual barrier InAlN/AlGaN/GaN-on-silicon high-electron-mobility transistors with Pt and Ni based gate stacks. Physica Status Solidi A: Applications and Materials Science, 214(8), 1600835. (doi: 10.1002/pssa.201600835)
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Abstract
In this work, we report the performance of 3 μm gate length "dual barrier„ InAlN/AlGaN/GaN HEMTs on Si substrates with gate-drain contact separations in the range 4-26 μm. Devices with Pt and Ni based gates were studied and their leakage characteristics are compared. Maximum drain current IDS of 1 A/mm, maximum extrinsic transconductance gm ~203 mS/mm and on-resistance Ron 4.07 Ω mm for gate to drain distance LGD = 4 μm were achieved. Nearly ideal sub-threshold swing of 65.6 mV/dec was obtained for LGD = 14 μm. The use of Pt based gate metal stacks led to a two to three orders of magnitude gate leakage current decrease compared to Ni based gates. The influence of InAlN layer thickness on the transistor transfer characteristics is also discussed.
Item Type: | Articles |
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Keywords: | HEMT, GaN, InAlN, AlGaN, silicon. |
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Wasige, Professor Edward and Thayne, Prof Iain and Floros, Mr Konstantinos and HEMAKUMARA, Dilini and Moran, Professor David and Li, Dr Xu and Cho, Dr Sung-Jin |
Authors: | Floros, K., Li, X., Guiney, I., Cho, S.-J., Hemakumara, D., Wallis, D. J., Wasige, E., Moran, D. A.J., Humphreys, C. J., and Thayne, I. G. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Research Group: | GaN Power Electronics |
Journal Name: | Physica Status Solidi A: Applications and Materials Science |
Publisher: | Wiley |
ISSN: | 1862-6300 |
ISSN (Online): | 1862-6319 |
Published Online: | 20 July 2017 |
Copyright Holders: | Copyright © 2017 Wiley-VCH Verlag GmbH & Co. |
First Published: | First published in Physica Status Solidi A: Applications and Materials Science 214(8): 1600835 |
Publisher Policy: | Reproduced under a Creative Commons License |
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